Thin Films and Heterostructures for Oxide Electronics
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Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.
Ch. 1Nanoscale phenomena in ferroelectric thin films3Ch. 2High-K candidates for use as the gate dielectric in silicon MOSFETs31Ch. 3Science and technology of high-dielectric constant (k) thin films for next generation CMOS79Ch. 4Materials requirements for magnetic random-access memory (MRAM) devices129Ch. 5Maganites, magnetite, and double-perovskite thin films and heterostructures153Ch. 6Diluted magnetic oxide systems195Ch. 7Epitaxial growth and properties of magnetically doped TiO[subscript 2]219Ch. 8Interfaces in materials with correlated electron systems251Ch. 9Electronic reconstruction at surfaces and interfaces of correlated electron materials279Ch. 10Wide band gap ZnO and ZnMgO heterostructures for future optoelectronic devices301Ch. 11Combinatorial synthesis of functional metal oxide thin films333Ch. 12Real-time growth monitoring by high-pressure RHEED during pulsed laser deposition355Ch. 13Recent advances in the deposition of multi-component oxide films by pulsed energy deposition385
