Fabrication of SiGe HBT BiCMOS Technology

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Author: John D. Cressler

ISBN-10: 1420066870

ISBN-13: 9781420066876

Category: Electronics - Semiconductors

SiGe HBT BiCMOS technology is the obvious groundbreaker of the Si heterostructures application space. To date virtually every major player in the communications electronics market either has SiGe up and running in-house or is using someone else’s SiGe fab as foundry for their designers. Key to this success lies in successful integration of the SiGe HBT and Si CMOS, with no loss of performance from either device. Filled with contributions from leading experts, Fabrication of SiGe HBT BiCMOS...

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SiGe HBT BiCMOS technology is the obvious groundbreaker of the Si heterostructures application space. To date virtually every major player in the communications electronics market either has SiGe up and running in-house or is using someone else’s SiGe fab as foundry for their designers. Key to this success lies in successful integration of the SiGe HBT and Si CMOS, with no loss of performance from either device. Filled with contributions from leading experts, Fabrication of SiGe HBT BiCMOS Technologies brings together a complete discussion of these topics into a single resource. Drawn from the comprehensive and well-reviewed Silicon Heterostructure Handbook, this volume examines the design, fabrication, and application of silicon heterostructure transistors. A novel aspect of this book the inclusion of numerous snapshot views of the industrial state-of-the-art for SiGe HBT BiCMOS technology. It has been carefully designed to provide a useful basis of comparison for the current status and future course of the global industry. In addition to the copious technical material and the numerous references contained in each chapter, the book includes easy-to-reference appendices on the properties of Si and Ge, the generalized Moll-Ross relations, integral charge-control relations, and sample SiGe HBT compact model parameters.

The Big Picture   John D. Cressler     1-1A Brief History of the Field   John D. Cressler     2-1Overview: Fabrication of SiGe HBT BiCMOS Technology   John D. Cressler     3-1Device Structures and BiCMOS Integration   David L. Harame     4-1SiGe HBTs on CMOS-Compatible SOI   Jin Cai   Tak H. Ning     5-1Passive Components   Joachim N. Burghartz     6-1Industry Examples at the State-of-the-Art: IBM   Alvin J. Joseph   James S. Dunn     7-1Industry Examples at the State-of-the-Art: Jazz   Paul H.G. Kempf     8-1Industry Examples at the State-of-the-Art: Hitachi   Katsuyoshi Washio     9-1Industry Examples at the State-of-the-Art: Infineon   Thomas F. Meister   H. Schafer   W. Perndl   J. Bock     10-1Industry Examples at the State-of-the-Art: IHP   Dieter Knoll     11-1Industry Examples at the State-of-the-Art: ST   Alain Chantre   M. Laurens   B. Szelag   H. Baudry   P. Chevalier   J. Mourier   G. Troillard   B. Martinet   M. Marty   A. Monroy     12-1IndustryExamples at the State-of-the-Art: Texas Instruments   Badih El-Kareh   Scott Balster   P. Steinmann   Hiroshi Yasuda     13-1Industry Examples at the State-of-the-Art: Philips   Roy Colclaser   Peter Deixler     14-1Properties of Silicon and Germanium   John D. Cressler     A.1-1The Generalized Moll-Ross Relations   John D. Cressler     A.2-1Integral Charge-Control Relations   Michael Schroter     A.3-1Sample SiGe HBT Compact Model Parameters   Ramana M. Malladi     A.4-1Index     I-1