Reactive Sputter Deposition, Vol. 109
In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.
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The use of thin films is continuously expanding. In the family of Physical Vapour Deposition techniques, sputtering is one of the most important over the past 40 years. In this book, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to:- start with reactive magnetron sputtering- understand and investigate the technique- control their sputtering process- tune their existing process, obtaining the desired thin films.
1 Simulation of the Sputtering Process T. Ono Ono, T. T. Kenmotsu Kenmotsu, T. T. Muramoto Muramoto, T. 12 Electron Emission from Surfaces Induced by Slow Ions and Atoms R. A. Baragiola Baragiola, R. A. P. Riccardi Riccardi, P. 433 Modeling of the Magnetron Discharge A. Bogaerts Bogaerts, A. I. Kolev Kolev, I. G. Buyle Buyle, G. 614 Modelling of Reactive Sputtering Processes S. Berg Berg, S. T. Nyberg Nyberg, T. T. Kubart Kubart, T. 1315 Depositing Aluminium Oxide: A Case Study of Reactive Magnetron Sputtering D. Depla Depla, D. S. Mahieu Mahieu, S. R. De Gryse De Gryse, R. 1536 Transport of Sputtered Particles Through the Gas Phase S. Mahieu Mahieu, S. K. Van Aeken Van Aeken, K. D. Depla Depla, D. 1997 Energy Deposition at the Substrate in a Magnetron Sputtering System S. D. Ekpe Ekpe, S. D. S. K. Dew Dew, S. K. 2298 Process Diagnostics J. W. Bradley Bradley, J. W. T. Welzel Welzel, T. 2559 Optical Plasma Diagnostics During Reactive Magnetron Sputtering S. Konstantinidis Konstantinidis, S. F. Gaboriau Gaboriau, F. M. Gaillard Gaillard, M. M. Hecq Hecq, M. A. Ricard Ricard, A. 30110 Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross-Corner and Cross-Magnetron Effect H. Kupfer Kupfer, H. F. Richter Richter, F. 33711 Reactively Sputter-Deposited Solid Electrolytes and Their Applications P. Briois Briois, P. F. Lapostolle Lapostolle, F. A. Billard Billard, A. 36712 Reactive Sputtered Wide-Bandgap p-Type Semiconducting Spinel AB[subscript 2]O[subscript 4] and Delafossite ABO[subscript 2] Thin Films for "Transparent Electronics" A. N. Banerjee Banerjee, A. N. K. K. Chattopadhyay Chattopadhyay, K. K. 41313 Oxide-BasedElectrochromic Materials and Devices Prepared by Magnetron Sputtering C. G. Granqvist Granqvist, C. G. 48514 Atomic Assembly of Magnetoresistive Multilayers H. Wadley Wadley, H. X. Zhou Zhou, X. W. H. Butler Butler, W. H. 497Index 561
