Spectroscopic Ellipsometry and Reflectometry: A User's Guide
While single wave ellipsometry has been around for years, spectroscopic ellipsometry is fast becoming the method of choice for measuring the thickness and optical properties of thin films. This book provides the first practical introduction to spectroscopic ellipsometry and the related techniques of reflectometry. A guide for practitioners and researchers in a variety of disciplines, it addresses a broad range of applications in physics, chemistry, electrical engineering, and materials science.
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While single wave ellipsometry has been around for years, spectroscopic ellipsometry is fast becoming the method of choice for measuring the thickness and optical properties of thin films. This book provides the first practical introduction to spectroscopic ellipsometry and the related techniques of reflectometry. A guide for practitioners and researchers in a variety of disciplines, it addresses a broad range of applications in physics, chemistry, electrical engineering, and materials science. Booknews Deals with measurement and analytical aspects of ellipsometry and reflectometry, for casual users of these two spectroscopic optical techniques. Coverage includes fundamentals of polarized light and ellipsometry, the nature of optical constants of materials, instrumental aspects of reflectometers, ellipsometric spectra, and single-wavelength ellipsometry. Discusses the analytical approach for collecting and analyzing ellipsometric and reflectance data, and looks at thin films and roughness. Includes a series of step-by-step prototypical analyses, and background appendices. Annotation c. by Book News, Inc., Portland, Or.
Preface1Perspective and History12Fundamentals63Optical Properties of Materials and Layered Structures234Instrumentation355The Anatomy of a Reflectance Spectrum546Aspects of Single-Wavelength Ellipsometry627The Anatomy of an Ellipsometric Spectrum758Analytical Methods and Approach859Optical Data Analysis9810Quality Assurance10811Very Thin Films11312Roughness123Prototypical Analyses1Thermal Oxide, LPCVD Nitride, or Photoresist on Silicon1332Silicon Oxynitrides, PECVD Silicon Oxides, and Polysilicon1383PECVD Silicon Nitride, Silicon Dioxide, and Photoresist on Silicon1474LPCVD Polysilicon and Amorphous Silicon1555Substrate Optical Constant Determination1616Analysis of Films on Transparent Substrates1667Very Thick Films1738Compositional Analysis of Materials1789Thin Metal Films18110Photoresist Optical Constants188ARegression Algorithms195BMaxwell's Equations and the Wave Equation199CSnell's Law, Fresnel's Equations, and the Total Reflection Coefficient Derivations and Historical Perspective212Index225
\ BooknewsDeals with measurement and analytical aspects of ellipsometry and reflectometry, for casual users of these two spectroscopic optical techniques. Coverage includes fundamentals of polarized light and ellipsometry, the nature of optical constants of materials, instrumental aspects of reflectometers, ellipsometric spectra, and single-wavelength ellipsometry. Discusses the analytical approach for collecting and analyzing ellipsometric and reflectance data, and looks at thin films and roughness. Includes a series of step-by-step prototypical analyses, and background appendices. Annotation c. by Book News, Inc., Portland, Or.\ \
