Thin-Film Deposition: Principles and Practice
Thin film deposition is a broad and burgeoning field,with applications ranging from razor blade coatings to quantum-well lasers. However,much of the available thin film literature is based on empirical knowledge,and focuses only on specific processes or applications. This volume rectifies that situation,offering a complete description od the theory and technology of thin film deposition. The book's broad perspective gives readers the tools to objectively evaluate and choose the appropriate...
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Thin film deposition is a broad and burgeoning field,with applications ranging from razor blade coatings to quantum-well lasers. However,much of the available thin film literature is based on empirical knowledge,and focuses only on specific processes or applications. This volume rectifies that situation,offering a complete description od the theory and technology of thin film deposition. The book's broad perspective gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. This indispensable volume also includes a complete list of symbols and an extensive index. Booknews A text on the basic principles of various thin-film vapor-phase deposition techniques, covering fundamentals and evolving topics including oil-free vacuum, microstructure control, selective CVD, and microanalysis. Discusses selection of techniques for specific applications, and shows how to predict and optimize deposition process behavior and solve production problems, with chapter exercises, a list of symbols and acronyms, and use of SI units. For graduate students in materials science, engineering, and applied physics. Annotation c. Book News, Inc., Portland, OR (booknews.com)
PrefaceAcknowledgmentsSymbols and AbbreviationsCh. 1Thin-Film Technology1Ch. 2Gas Kinetics9Ch. 3Vacuum Technology35Ch. 4Evaporation63Ch. 5Deposition119Ch. 6Epitaxy221Ch. 7Chemical Vapor Deposition307Ch. 8Energy Beams371Ch. 9Glow-Discharge Plasmas453Ch. 10Film Analysis557Appendix A Units585Appendix B Vapor Pressures of the Elements587Appendix C Sputtering Yields of the Elements591Appendix D Characteristics of Tungsten Filaments593Appendix E Sonic Orifice Flow597Index599
\ BooknewsA text on the basic principles of various thin-film vapor-phase deposition techniques, covering fundamentals and evolving topics including oil-free vacuum, microstructure control, selective CVD, and microanalysis. Discusses selection of techniques for specific applications, and shows how to predict and optimize deposition process behavior and solve production problems, with chapter exercises, a list of symbols and acronyms, and use of SI units. For graduate students in materials science, engineering, and applied physics. Annotation c. Book News, Inc., Portland, OR (booknews.com)\ \
